A Method for Beating the Diffraction Limit in Photolithography
Etec Systems, Inc.
2000鈥�01
Etec Systems, Inc. is a worldwide leader in the designing, manufacturing, and marketing of mask-making solutions for the semiconductor industry.卢鈥� Our Clinic team is providing Etec with a feasibility study on a potential technology for tightening the focus point of a laser on the photoresist layer of a mask beyond the normal diffraction limit, enabling the writing of smaller mask features.卢鈥� We report both analytical and experimental results.
Advisor(s): Peter N. Saeta.